Influence of Ar and N-2 Pressure on Plasma Chemistry, Ion Energy, and Thin Film Composition During Filtered Arc Deposition From Ti3SiC2 Cathodes

Eriksson, Anders O. (Corresponding author); Mraz, Stanislav (Corresponding author); Jensen, Jens (Corresponding author); Hultman, Lars (Corresponding author); Zhirkov, Igor (Corresponding author); Schneider, Jochen M. (Corresponding author); Rosen, Johanna (Corresponding author)

New York, NY : IEEE (2014)
Journal Article

In: IEEE transactions on plasma science
Volume: 42
Issue: 11
Page(s)/Article-Nr.: 3498-3507


  • Division of Materials Science and Engineering [520000]
  • Chair of Materials Chemistry [521110]