Bimodal substrate biasing to control gamma-Al2O3 deposition during reactive magnetron sputtering

Prenzel, Marina; Kortmann, Annika; Stein, Adrian; von Keudell, Achim; Nahif, Farwah; Schneider, Jochen M.

Melville, NY : American Institute of Physics, AIP [u.a.] (2013)
Journal Article

In: Journal of applied physics
Volume: 114
Issue: 11
Page(s)/Article-Nr.: 113301

Identifier