Bimodal substrate biasing to control gamma-Al2O3 deposition during reactive magnetron sputtering
Prenzel, Marina (Corresponding author); Kortmann, Annika; Stein, Adrian; von Keudell, Achim; Nahif, Farwah; Schneider, Jochen M.
Melville, NY : American Institute of Physics, AIP [u.a.] (2013)
Journal Article
In: Journal of applied physics
Volume: 114
Issue: 11
Page(s)/Article-Nr.: 113301
Identifier
- DOI: 10.1063/1.4819227
- RWTH PUBLICATIONS: RWTH-CONV-087869