Formation of crystalline γ-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering

Prenzel, M.; Kortmann, A.; von Keudell, A.; Nahif, F.; Schneider, Jochen M.; Shihab, M.; Brinkmann, R. P.

Bristol : IOP Publ. [u.a.] (2013)
Journal Article

In: Journal of physics / D, Applied physics
Volume: 46
Issue: 8
Page(s)/Article-Nr.: 084004

Identifier