Influence of the normalized ion flux on the constitution of alumina films deposited by plasma-assisted chemical vapor deposition

Kurapov, Denis; Reiss, Jennifer; Trinh, David H.; Hultman, Lars; Schneider, Jochen M.

New York, NY : American Institute of Physics (2007)
Journal Article

In: Journal of vacuum science & technology / A, Vacuum, surfaces, & films
Volume: 25
Issue: 4
Page(s)/Article-Nr.: 831-836

Identifier