Effect of ion irradiation during deposition on the structure of alumina thin films grown by plasma assisted chemical vapour deposition

Kyrylov, Oleksandr; Kurapov, D.; Schneider, Jochen M.

Berlin [u.a.] : Springer (2005)
Journal Article

In: Applied physics / A, Materials science & processing
Volume: 80
Issue: 8
Page(s)/Article-Nr.: 1657-1660

Identifier