The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
Emmerlich, Jens; Mráz, Stanislav; Snyders, Rony; Jiang, Kaiyun; Schneider, Jochen M.
Kidlington : Elsevier Science (2008)
Journal Article
In: Vacuum
Volume: 82
Issue: 8
Page(s)/Article-Nr.: 867-870
Identifier
- DOI: 10.1016/j.vacuum.2007.10.011
- RWTH PUBLICATIONS: RWTH-CONV-010932