The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering

Emmerlich, Jens; Mráz, Stanislav; Snyders, Rony; Jiang, Kaiyun; Schneider, Jochen M.

Kidlington : Elsevier Science (2008)
Journal Article

In: Vacuum
Volume: 82
Issue: 8
Page(s)/Article-Nr.: 867-870


  • Chair of Materials Chemistry [521110]
  • Division of Materials Science and Engineering [520000]