Influence of the plasma chemistry on the composition of ZrOx and NbOx thin films deposited by reactive magnetron sputtering
Mráz, Stanislav; Schneider, Jochen M.
New York, NY : Plenum Publ. Corp. (2006)
Journal Article
In: Plasma chemistry and plasma processing
Volume: 26
Issue: 2
Page(s)/Article-Nr.: 197-203
Identifier
- DOI: 10.1007/s11090-006-9001-y
- RWTH PUBLICATIONS: RWTH-CONV-030911